The M6 is the latest generation of high-end TOF-SIMS instruments developed by IONTOF. New ground-breaking ion beam and mass analyzer technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research.

 

The revolutionary new design of the extraction optics, the ion transfer and detection system provides a new level of mass resolution, mass accuracy and transmission. This new level of performance allows mass interferences of e.g. CH/¹³C, CH2/N containing molecules to be resolved even in the higher mass range, thus facilitating molecular peak identification.

In combination with high repetition rates and the improved primary ion currents of the Nanoprobe 50, three times lower detection limits can be achieved in dual beam depth profiling.

The new design has also been optimised for the measurements in the so-called delayed extraction mode making it the first TOF-SIMS instrument on the market to combine high resolution imaging with spot sizes below 50 nm with high mass resolution spectrometry.

The Nanoprobe 50 is the latest generation bismuth cluster ion source for the M6. The source provides pulsed primary ion currents of up to 40 pA and an ultimate lateral resolution of well below 50 nm. The new bipolar bunching system can operate at repetition rates of up to 50 kHz, allowing for extremely high data rates and improved detection limits. The Nanoprobe 50 is the ideal primary ion source for high lateral resolution microanalysis and imaging as well as high mass resolution surface spectrometry and depth profiling.

The interpretation of organic TOF-SIMS spectra can be quite challenging and requires a reasonably experienced user. To facilitate data interpretation IONTOF provides different tools such as spectra libraries, advanced software package and the ultimate performance Q Exactive^TM extension for the M6. With the new ToF MS/MS option IONTOF now also offers a more cost effective MS/MS solution for the M6. The option is ideally suited for quick confirmation of anticipated contaminants or compositions and fast MS/MS imaging or depth profiling applications. Key features of the new TOF MS/MS are:

 

Information concerning chemical composition, physical properties and the three-dimensional structure of materials and devices at the nanometre scale is of major importance for new developments in nanoscience and nanotechnology. The new M6 Plus platform combines the high-end performance of the M6 with the possibility to perform in situ SPM measurements making it the ideal tool for high-end nano characterization.

 

 

With the Q Exactive^TM extension for the M6, IONTOF provides the first commercial SIMS instrument which combines the highest mass resolution (> 240,000) and highest mass accuracy (< 1 ppm) with high resolution cluster SIMS imaging. The powerful combination of the gas cluster ion source and the Orbitrap^TM analyzer enables the distinction of different features even in highly complex organic samples.

 

 

With the TOF.SIMS 5 IONTOF offers a field proven and efficient TOF-SIMS tool which still outperforms most of its external rivals. The current design guarantees good performance in all fields of SIMS applications, making it an extremely attractive SIMS tool for customers in industry and academia.

 

 

With the Qtac IONTOF offers a high sensitivity Low Energy Ion Scattering (LEIS) instrument. The extreme surface sensitivity of LEIS makes the Qtac the perfect instrument to study surface processes in many production and research areas on materials such as catalysts, semiconductors, metals, polymers, and fuel cells.