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TOF-SIMS
Products
Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is
a very sensitive surface analytical technique, well
established for many industrial and research applications.
It provides detailed elemental and molecular information
about the surface, thin layers, interfaces of the sample,
and gives a full three-dimensional analysis. The use is
widespread, including semiconductors, polymers, paint,
coatings, glass, paper, metals, ceramics, biomaterials,
pharmaceuticals and organic tissue. The TOF.SIMS 5 and the
TOF.SIMS 300 are the latest generation of high-end TOF-SIMS
instruments developed over the last 25 years. Their design
guarantees optimum performance in all fields of SIMS
applications.
LEIS
Products
The significant advantages
of low energy ion scattering (LEIS) are extreme surface
sensitivity and quantification. Contrary to many other
established surface analysis techniques such as XPS or AES,
which generally integrate over several atomic layers, LEIS
characterizes individual atomic layers. These features make
the Qtac100 an extremely valuable instrument when
information about the composition of the first atomic layer
is required. Static depth profiling is used to analyze the
sub-surface atomic layers
and to determine layer thicknesses. The Qtac100
extends
the range of LEIS applications to surface imaging and
dynamic sputter depth profiling.
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